Course syllabus
Motivation
Microelectronics has had tremendous development during the last ten years broadening the field of applications in many directions. The industry is constantly pushing the critical device dimensions down to the nanometer scale. This is not possible without development of the material science and nano-processing technology. A great many sophisticated instruments and techniques built up to make and characterize micro- and nano-scale devices have already become indispensable in virtually every research area and high-tech industry. There are numerous and growing novel applications in telecommunication, safety, photonics, optoelectronics, energy harvesting, micro-fluidics, sensors, information storage, etc. that demand reliable nano-processing techniques and tools. Further progress requires a continuous search for new materials (e.g. graphene), new physical principles of operation (e.g. spintronics) and advanced methods of fabrication, processing and characterization of nano-devices (e.g. focused-ion milling, x-ray- and near-field lithography).
Course-PM
FKA196 Fundamentals of micro- and nanotechnology lp1 HT20 (7.5 hp)
Course is offered by the department of Microtechnology and Nanoscience
Contact details
- examiner & lecturer: August Yurgens (AY), yurgens@chalmers.se; tel. +46 70 929 69
- supervisors: Mattias Fredriksson, mattias.fredriksson@chalmers.se; tel. +46 31 772 18 92 and Eric Andersson, ericand@chalmers.se
Course purpose
The course aims at giving a basic knowledge of modern micro- and nano-scale processing (pattern transfer by different lithography techniques; the plasma-, thermal-, and chemical processes for etching and modification of materials; thin film deposition methods), as well as characterization techniques for assessing the resulting materials- and device properties. Also, a few examples of basic processing steps for fabrication of CMOS-transistors, light-emitting diodes, lasers, micro-electromechanical systems and microfluidic devices will be described. Laboratory exercises in the clean room of the Microtechnology Centre at Chalmers (MC2) will demonstrate how the nano-scale fabrication equipment functions in reality.
Schedule
Course literature
"Introduction to Microfabrication" by Sami Fransilla (ISBN 978-0-470-74983-8, Wiley). This is available as E-book at Chalmers Library. Lecture PPT will be available in Ping Pong close to lecture date..
2 other books that can be used as reference material; "Introduction to Microelectronic Fabrication" by R.C. Jaeger (Pearson Edu Ltd, London, ISBN 0-201-44494-7) and "The Materials Science of Thin Films" by M. Ohring (ISBN: 012524990x, 1992 (ISBN 0125249756) .
"Introduction to Microelectronic Fabrication" by R.C. Jaeger (Pearson Edu. Ltd., London; ISBN 0-201-44494-7). Also, "The Materials Science of Thin Films" by M. Ohring (ISBN: 012524990x; 1992) is available as an e-book free of charge through Chalmers library. Second edition (ISBN 0125249756) can be used as well.
Course design
The core of the course is dedicated to the theory and practice of micro- and nano-fabrication techniques, one of the most important constituents of modern Nanoscale Technology. Modern pattern transfer techniques like e-beam- or x-ray lithography and various thin film deposition methods including thermal-evaporation, sputtering, chemical-vapor deposition, and epitaxy are covered in this course, with their physical- and chemical backgrounds shortly mentioned. Film formation, its structure and methods of characterization are explained, with particular emphasis on correlation between the deposition parameters and resulting material properties. During the lectures students also learn the vacuum systems including system operation and design, and the physical processes in gases. Also, a few practical devices like CMOS-transistors or light-emitting diodes are considered in more details.
This course includes lectures, several demonstrations, and a literature project. A number of quizzes are given to deepen the knowledge obtained during the lectures and to prepare for the quiz-based exam.
Changes made since the last occasion
Grading has slightly been changed: now 15% will be given for doing homework assignments, instead of 20%. Participation in the lab demonstrations and hands-on exercise will now give you a dedicated 5%.
Learning objectives and syllabus
Learning objectives:
- describe and arrange material-science aspects and physical principles of nano-scale technology
- examine and illustrate the link between processing, material structure, resulting properties, and performance of the devices
- select proper materials, deposition, and characterization techniques for a given task
- describe and assess advantages and limitations of different lithography- and thin-film deposition techniques
- overview the development- and describe the most recent trends in nano-scale technology
- present a critical summary of one of the novel and promising nano- fabrication techniques or devices at a student conference
- tell the general rules and safety procedures for working in the clean-room environment and with hazardous chemicals.
The course provides a basis for further studies at the undergraduate and postgraduate level, diploma work, and professional preparation in the field of nanotechnology.
Link to the syllabus on Studieportalen.
If the course is a joint course (Chalmers and Göteborgs Universitet) you should link to both syllabus (Chalmers and Göteborgs Universitet).
Examination form
Quiz-based written examination usually containing 120-130 quiz questions (70%). 15% will be given for doing homework assignments. The last 10% will be given for making a literature project and participation in the lab demonstrations and hands-on exercise (5%).
Course summary:
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